Anti-contaminating adsorbed film and method of manufacturing the

Details Anti-contaminating adsorbed film and method of manufacturing the Anti-contaminating adsorbed film and method of manufacturing the

1993-11-08

1995-04-18

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427529, 427352, 427341, B05D 306

Patent

active

054077095

ABSTRACT:
This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a --Si-- group and fluorocarbon group. The --Si-- group is covalently bonded to the substrate surface. It also provides a forming method of an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular a precursor film with water after the removing step, and drying the adsorbed monomolecular film.

REFERENCES:
patent: 4539061 (1985-09-01), Sagiv
patent: 4902585 (1990-02-01), Ogawa et al.
patent: 5010356 (1991-04-01), Albinson

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