Anodizing apparatus and an anodizing method

Details Anodizing apparatus and an anodizing method Anodizing apparatus and an anodizing method

1996-08-08

1998-03-31

Niebling, John

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C25D 1102

Patent

active

057334200

ABSTRACT:
Arranged in a series are an electrolyte tank capable of holding one of a number of substrates, each substrate having a conducting film thereon, and a cathode so that the cathode and substrate face each other in an electrolyte, an anodizing chamber for anodizing the substrate, a pretreatment chamber for calcining a photoresist mask put on part of the conducting film, and a post-treatment chamber for washing and drying the anodized substrate. A substrate transportation mechanism is provided for serially transporting the substrates one by one from the pretreatment chamber to the post-treatment chamber via the anodizing chamber. In the anodizing chamber described above, a formation voltage is increased to a value such that an oxide film with a desired thickness is formed so that the value of a current flowing through an aluminum alloy film as the conducting film is kept constant with the current density ranging from 3.0 mA/cm.sup.2 to 15.0 mA/cm.sup.2.

REFERENCES:
patent: 3640854 (1972-02-01), Klein
patent: 3775262 (1973-11-01), Heyerdahl
patent: 3853733 (1974-12-01), Jacobs
patent: 3864219 (1975-02-01), Dosch
patent: 4192729 (1980-03-01), Cancelleri
patent: 4576685 (1986-03-01), Goffredo et al.
patent: 4936957 (1990-06-01), Dickey
patent: 5296126 (1994-03-01), Izrael
patent: 5359206 (1994-10-01), Yamamoto

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