Anodized aluminum substrate for plasma etch reactor

Details Anodized aluminum substrate for plasma etch reactor Anodized aluminum substrate for plasma etch reactor

1984-10-22

1987-04-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

046576177

ABSTRACT:
A substrate to use as electrode in a plasma etch reactor is fabricated from aluminum with an annulus that is anodized to protect it from being exposed to the plasma.

REFERENCES:
patent: 3757733 (1973-09-01), Reinberg
patent: 4313783 (1982-02-01), Davies et al.
patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4341582 (1982-07-01), Kohman et al.
patent: 4422896 (1983-12-01), Class et al.
patent: 4526670 (1985-07-01), Hajj

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