Anode plate for a parallel-plate reactive ion etching reactor

Details Anode plate for a parallel-plate reactive ion etching reactor Anode plate for a parallel-plate reactive ion etching reactor

1986-11-03

1989-03-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 204298, B44C 122, C03C 2506, C03C 1500

Patent

active

048103225

ABSTRACT:
An anode for a reactive ion etching (RIE) system has a plurality of holes formed therethrough. The holes produce a plasma glow about each hole which results in an increase in the etch rate of wafers to be etched on a cathode opposite the holes. The holes are arranged in the anode to provide a uniform etch rate on one wafer or a batch of wafers to be etched. By varying the pressure in the system, the presence of plasma glow and hence the etch rate uniformity is controlled.

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patent: 4601807 (1986-07-01), Lo et al.
patent: 4612432 (1986-09-01), Sharp-Geiscer

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