Anode for magnetic sputtering apparatus

Details Anode for magnetic sputtering apparatus Anode for magnetic sputtering apparatus

1984-01-17

1984-10-23

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192C, C23C 1500

Patent

active

044787022

ABSTRACT:
An improved anode system for producing uniform coatings by magnetic sputtering is disclosed, comprising a pair of anode plates symmetrically designed and positioned along the length of the cathode.

REFERENCES:
patent: 4162954 (1979-07-01), Morrison
patent: 4166018 (1979-08-01), Chapin
patent: 4239611 (1980-12-01), Morrison
patent: 4422896 (1983-12-01), Class et al.
Denton, Metal Finishing, Jun. 1979. pp. 53-57.

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