Anode for magnetic sputtering

Details Anode for magnetic sputtering Anode for magnetic sputtering

1984-10-23

1986-07-15

Andrews, R. L.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1400

Patent

active

046004904

ABSTRACT:
An improved anode system for producing coatings by magnetic sputtering is disclosed, comprising an anode structure of expanded metal.

REFERENCES:
patent: 4166018 (1979-08-01), Chapin
patent: 4426274 (1984-01-01), Ephrath
patent: 4426275 (1984-01-01), Meckel

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