Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-11-01
2005-11-01
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298160, C315S039510, C315S039530, C315S039710, C315S039750
Reexamination Certificate
active
06960283
ABSTRACT:
Anode with a 2450 MHz resonance frequency, and magnetron therewith, the anode including a cylindrical anode body with an inside diameter in a range of 32.5 to 34.0 mm, a total of ten vanes fitted to an inside circumferential surface of the anode body in a radial direction, and an inner strap and an outer strap provided to both of an upper surface and a lower surface of each vane, a distance of the inner strap and the outer strap being in a range of 0.8 to 1.2 mm, and each of the inner strap and outer strap being in contact with every second vanes for electrical connection of the vanes alternately. The anode body and the vanes are formed as one unit for simplification of a fabrication process.
REFERENCES:
patent: 5049782 (1991-09-01), Aiga et al.
patent: 5635797 (1997-06-01), Kitakaze et al.
patent: 5767749 (1998-06-01), Shon et al.
patent: 55-33793 (1980-03-01), None
patent: 56-149750 (1981-11-01), None
English language Abstract of JP 56-149750.
English language Abstract of JP 55-33793.
Lee Jong Soo
Lee Yong Soo
Greenblum & Bernstein P.L.C.
LG Electronics Inc.
Versteeg Steven
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