Annealing process

Details Annealing process Annealing process

1993-03-18

1994-10-04

Bell, Janyce

Coating processes

With post-treatment of coating or coating material

Heating or drying

427444, B05D 300

Patent

active

053524926

ABSTRACT:
In a process and apparatus for annealing a substance, such as polysilicon, which is deposited on a substrate, such as a glass plate, the annealing temperature is required to be greater than the softening temperature of the substrate. To prevent deformation of the substrate it is supported on a liquid of density greater than that of the substrate. The liquid is preferably molten tin.

REFERENCES:
patent: 3512950 (1970-05-01), Long
patent: 4474831 (1984-10-01), Downey
patent: 5213670 (1993-05-01), Bertagnolli et al.
Patent Abstracts of Japan, vol. 015, No. 036 (E-1027) 29 Jan. 1991.

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