Annealing method of zinc oxide thin film

Details Annealing method of zinc oxide thin film Annealing method of zinc oxide thin film

2009-03-03

2011-10-11

Trinh, Michael (Department: 2822)

Semiconductor device manufacturing: process

Having metal oxide or copper sulfide compound semiconductor...

C438S608000, C438S660000

Reexamination Certificate

active

08034656

ABSTRACT:
An annealing method of a zinc oxide thin film, comprises loading a substrate coated with a zinc oxide thin film into a chamber, allowing a hydrogen gas to be flowed into the chamber, fixing pressure in the chamber and annealing the zinc oxide thin film using the hydrogen gas in the chamber.

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