Anisotropic deposition of dielectrics

Fishing – trapping – and vermin destroying

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437238, 437243, 427535, H01L 21316

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active

053025555

ABSTRACT:
A method for anisotropically depositing a dielectric from a precursor gas in a reactor is disclosed. The method includes reduced pressure, reduced oxygen/precursor gas flow ratio, increased spacing between shower head and susceptor; and also a susceptor having a diameter greater than the diameter of the wafer.

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"Directional Deposition of Dielectric Silicon Oxide by Plasma Enhanced Teos Process," J. J. Hsieh et al., VMIC Conference, Jun. 12-13, 1989, IEEE 1989, pp. 411-415.

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