Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Patent
1991-10-01
1994-10-25
Naguno, Mark
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
556 55, 556 56, 556415, 556416, 556417, 556428, 556432, 556436, 556437, 556438, 556439, 556440, 556441, 556442, 526298, C07F 728, C07F 710
Patent
active
053591011
ABSTRACT:
Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula ##STR1## wherein A is --H or --CH.dbd.CH.sub.2 ; X is a strong electron withdrawing group;
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Naguno Mark
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