Anionic and Lewis base photopolymerization process and its...

Details Anionic and Lewis base photopolymerization process and its... Anionic and Lewis base photopolymerization process and its...

2007-08-07

2007-08-07

Berman, Susan (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S060000, C522S063000, C522S065000, C522S066000, C556S058000, C556S059000, C556S138000, C556S140000

Reexamination Certificate

active

11114753

ABSTRACT:
The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking an oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises:(a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and(b) irradiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.

REFERENCES:
patent: 4172726 (1979-10-01), Nakamura et al.
patent: 4343922 (1982-08-01), Shaffer
patent: 4540764 (1985-09-01), Hinman
patent: 4585837 (1986-04-01), Mosher
patent: 4623735 (1986-11-01), Petersen
patent: 4681828 (1987-07-01), Alexandrovich et al.
patent: 4752547 (1988-06-01), Cowen et al.
patent: 5142073 (1992-08-01), Schrock et al.
patent: 5415984 (1995-05-01), Komamura et al.
patent: 5476755 (1995-12-01), Nakayama et al.
patent: 5597936 (1997-01-01), Perkins et al.
patent: 5739367 (1998-04-01), Carr et al.

Affiliated with

Also associated with

Rating

Anionic and Lewis base photopolymerization process and its... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Anionic and Lewis base photopolymerization process and its..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anionic and Lewis base photopolymerization process and its... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3833598