Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Reexamination Certificate
2005-06-28
2005-06-28
Berman, Susan (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
C522S057000, C522S062000, C522S065000, C522S066000, C522S174000, C522S180000, C522S173000, C522S182000
Reexamination Certificate
active
06911485
ABSTRACT:
The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking a oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises:(a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and(b) irridiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.
REFERENCES:
patent: 4354024 (1982-10-01), Johnson et al.
patent: 4355161 (1982-10-01), Johnson et al.
patent: 4727123 (1988-02-01), Weinert et al.
patent: 4740577 (1988-04-01), DeVoe et al.
patent: 4954414 (1990-09-01), Adair et al.
patent: 5089536 (1992-02-01), Palazzotto
patent: 5415984 (1995-05-01), Komamura et al.
patent: 5439863 (1995-08-01), Bottcher et al.
patent: 5468785 (1995-11-01), Greuel et al.
patent: 5476755 (1995-12-01), Nakayama et al.
patent: 5556705 (1996-09-01), Bottcher et al.
patent: 5606085 (1997-02-01), Bell et al.
patent: 5652280 (1997-07-01), Kutal
patent: 5691113 (1997-11-01), Kutal
patent: 5728750 (1998-03-01), Schwalm et al.
patent: 5739367 (1998-04-01), Carr et al.
patent: 5776997 (1998-07-01), Hafner et al.
patent: 5877230 (1999-03-01), Kutal
patent: 5973098 (1999-10-01), Keita et al.
patent: 6127445 (2000-10-01), Kutal et al.
patent: WO 93/10483 (1993-05-01), None
International Search Report, PCT/US03/12069.
Keita Gabriel
Kutal Charles R.
Turshani Yassin
Wanigatunga Sirisoma
Berman Susan
Essilor International Campagnie Generale D'Optique
The University of Georgia Research Foundation Inc.
Thomas Kayden Horstemeyer & Risley LLP
LandOfFree
Anionic and Lewis base photopolymerization process and its... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Anionic and Lewis base photopolymerization process and its..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anionic and Lewis base photopolymerization process and its... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3509649