Anionic abrasive particles treated with positively charged...

Abrasive tool making process – material – or composition – With inorganic material

Reexamination Certificate

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C051S308000, C051S309000, C106S003000, C438S692000, C438S693000, C216S099000, C216S100000, C216S101000, C216S102000, C216S105000

Reexamination Certificate

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10855276

ABSTRACT:
The invention provides chemical-mechanical polishing systems, and methods of polishing a substrate using the polishing systems, comprising (a) an abrasive, (b) a liquid carrier, and (c) a positively charged polyelectrolyte with a molecular weight of about 15,000 or more, wherein the abrasive comprises particles that are electrostatically associated with the positively charged polyelectrolyte.

REFERENCES:
patent: 4752628 (1988-06-01), Payne
patent: 4867757 (1989-09-01), Payne
patent: 5123958 (1992-06-01), Wiand
patent: 5352277 (1994-10-01), Sasaki
patent: 5489233 (1996-02-01), Cook et al.
patent: 5527423 (1996-06-01), Neville et al.
patent: 5709588 (1998-01-01), Muroyama
patent: 5860848 (1999-01-01), Loncki et al.
patent: 5876490 (1999-03-01), Ronay
patent: 5958794 (1999-09-01), Bruxvoort et al.
patent: 5968280 (1999-10-01), Ronay
patent: 6099604 (2000-08-01), Sandhu et al.
patent: 6117220 (2000-09-01), Kodama et al.
patent: 6117775 (2000-09-01), Kondo et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6132637 (2000-10-01), Hosali et al.
patent: 6171352 (2001-01-01), Lee et al.
patent: 6303049 (2001-10-01), Lee et al.
patent: 6348076 (2002-02-01), Canaperi et al.
patent: 6776810 (2004-08-01), Cherian et al.
patent: 6824579 (2004-11-01), Ronay
patent: 2002/0052173 (2002-05-01), Andreas
patent: 2003/0139116 (2003-07-01), Moeggenborg et al.
patent: 1 036 836 (2000-09-01), None
patent: 1 104 778 (2001-06-01), None
patent: 1 118 647 (2001-07-01), None
patent: 64-87146 (1989-03-01), None
patent: 2000-164631 (2000-06-01), None
patent: WO 99/64527 (1999-12-01), None
patent: WO 01/02134 (2001-01-01), None
patent: WO 01/12740 (2001-02-01), None
patent: WO 01/14496 (2001-03-01), None
patent: WO 01/19935 (2001-03-01), None
McNamee et al.,Colloids and Surfaces, A: Physicochemical and Engineering Aspects, 193, 175-185 (2001).
Schwarz et al.,Colloids and Surfaces, A: Physicochemical and Engineering Aspecs, 140(1-3), 377-384 (1998).
Schwarz, S. et al.Colloids and Surfaces, A: Physicochemical and Engineering Aspecs, 163(1), 17-27 (2000).

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