Anion-selective, sensitive film, electrode containing the same a

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204416, 204418, 252 623Q, 252500, 357 8, 422 8203, 564291, 568 9, 521 25, G01N 2746

Patent

active

051164817

ABSTRACT:
An anion-selective electrode of the present invention comprises, as anion sensitive substance, a tetraalkyl type, quaternary phosphonium salt having four alkyl radicals, each having 8 to 24 carbon atoms; a combination of a tetraalkyl onium salt having four alkyl radicals each having 10 to 24 carbon atoms, and an onium salt having one alkyl radical with 1 to 20 carbon atoms and three alkyl radicals with the proviso that the number of carbon atoms contained in the three alkyl radicals each is larger than that contained in the one alkyl radical; or a tetraalkyl type, quaternary onium salt having an asymmetrical molecular structure. The anion-selective electrode has good properties including selectivity and measurement accuracy. An anion-selective, field effect transistor or a chemical analysis apparatus, provided with the anion-selective sensitive substance, is suitable for measuring an anion concentration with a high accuracy.

REFERENCES:
patent: 4349426 (1982-09-01), Sugahara et al.
patent: 4670127 (1987-06-01), Ritter et al.
patent: 4936975 (1990-06-01), Shibata et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Anion-selective, sensitive film, electrode containing the same a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Anion-selective, sensitive film, electrode containing the same a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Anion-selective, sensitive film, electrode containing the same a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-417278

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.