Angle detector device for silicon wafers

Details Angle detector device for silicon wafers Angle detector device for silicon wafers

1990-08-08

1991-12-17

Westin, Edward P.

X-ray or gamma ray systems or devices

Accessory

Alignment

378 34, 378 35, 378 70, 378 71, A61B 608

Patent

active

050739182

ABSTRACT:
An angle detector for determining the orientation of the crystal axes of silicon wafers is disclosed. A portion of an X-ray beam generated by a synchrotron for exposing a wafer is directed onto the back surface of the wafer via a pair of monocrystalline silicon plate diffraction gratings and a slit having a pin-hole for collimating the X-ray. The X-ray beams diffracted by the wafer form a diffraction pattern on a two-dimensional photosensor array, from which pattern the angular position of the wafer is determined. The angle is determined by an image processor, a memory for storing a diffraction pattern corresponding to a predetermined angular position of the wafer, and a comparison of the image processor output and the memory data.

REFERENCES:
patent: 4412345 (1983-10-01), Workman et al.

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