Analyzing apparatus and analyzing method

Details Analyzing apparatus and analyzing method Analyzing apparatus and analyzing method

2005-08-30

2005-08-30

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S088000, C378S079000, C250S281000

Reexamination Certificate

active

06937695

ABSTRACT:
Provided are an analyzing apparatus and an analyzing method for analyzing a sample by performing measurements using X-rays and measuring a gas generated from the sample.

REFERENCES:
patent: 3089031 (1963-05-01), Endter
patent: 5528032 (1996-06-01), Uchiyama
patent: 0 943 914 (1999-09-01), None
patent: 2156974 (1985-10-01), None
patent: 8-15185 (1996-01-01), None
patent: 10-19815 (1998-01-01), None
patent: 2000292375 (2000-10-01), None
EPO Search Report dated Dec. 29, 2003, in EP Application No. 03256110.2-2204.

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