X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-02-27
2007-02-27
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S046000, C378S073000, C378S083000
Reexamination Certificate
active
10952823
ABSTRACT:
An analytical method for determining crystallographic phases of a measuring sample comprises the steps of acquiring a diffraction pattern of the measuring sample and qualitative phase analysis of the measured diffraction pattern, acquiring an element spectrum of the measuring sample and determining concentrations of chemical elements in the measuring sample from the acquired element spectrum, and carrying out a quantitative phase analysis of the measuring sample on the basis of the measured intensities of the acquired diffraction pattern thereby taking into consideration determined element concentrations as a boundary condition, wherein differences between calculated and measured intensities of the diffraction pattern and between calculated and determined element concentrations are simultaneously minimized in an iterative process. The inventive method permits quantitative phase determination with high reliability.
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Bruker AXS GmbH
Glick Edward J.
Midkiff Anastasia S.
Vincent Paul
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