Optics: measuring and testing – Of light reflection
Reexamination Certificate
2007-08-15
2008-12-02
Toatley, Jr., Gregory J (Department: 2877)
Optics: measuring and testing
Of light reflection
C356S630000
Reexamination Certificate
active
07460236
ABSTRACT:
A method of examining thin layer structures on a surface for differences in respect of optical thickness, which method comprises the steps of: irradiating the surface with light so that the light is internally or externally reflected at the surface; imaging the reflected light on a first two-dimensional detector; sequentially or continuously scanning the incident angle and/or wavelength of the light over an angular and/or wavelength range; measuring the intensities of light reflected from different parts of the surface and impinging on different parts of the detector, at least a number of incident angles and/or wavelengths, the intensity of light reflected from each part of the surface for each angle and/or wavelength depending on the optical thickness of the thin layer structure thereon; and determining from the detected light intensities at the different light incident angles and/or wavelengths an optical thickness image of the thin layer structures on the surface. According to the invention, part of the light reflected at said surface is detected on a second detector to determine the incident angle or wavelength of the polarized light irradiating the surface. An apparatus for carrying out the method is also disclosed.
REFERENCES:
patent: 5028132 (1991-07-01), Hickel et al.
patent: 5141311 (1992-08-01), Hickel et al.
patent: 5237392 (1993-08-01), Hickel et al.
patent: 5313264 (1994-05-01), Ivarsson et al.
patent: 6493097 (2002-12-01), Ivarsson
patent: 6714303 (2004-03-01), Ivarsson
patent: 7081958 (2006-07-01), Ivarsson
patent: 286 195 (1988-10-01), None
patent: 0 469 377 (1991-07-01), None
patent: WO 90/05295 (1990-05-01), None
patent: WO 93/14392 (1993-07-01), None
Berger, et al., “Resolution in Surface Plasmon Microscopy”, Review of Scientific Instruments 65(9):2829-2836, 1994.
Hayashi, et al., “Experimental Instrument for Observing Angle- and Frequency-scanned Attenuated Total Reflection Spectra”, Review of Scientific Instruments 67(9):3039-3043, 1996.
Karlsen, et al., “Simultaneous Determination of Refractive Index and Absorbance Spectra of Chemical Samples Using Surface Plasmon Resonance”, Sensors and Actuators B(Part II):747-749, 1995.
Knoll, “Optical Characterization of Organic Thin Films and Interfaces with Evanescent Waves”, MRS Bulletin 16:23-39, 1991.
Kooyman, et al., “Surface Plasmon Microscopy of Two Crystalline Domains in a Lipid Monolayer”, Langmuir 7:1506-1509, 1991.
Kooyman, et al., “Vibrating Mirror Surface Plasmon Resonance Immunosensor”, Anal. Chem. 63:83-85, 1991.
Lenferink, et al., “An Improved Optical Method for Surface Plasmon Resonance Experiments”, Sensors and Actuators B3(4):261-265, 1991.
Beaglehole, D. (Dec. 1988). “Performance of a microscopic imaging ellipsometer”. Review of Scientific Instruments, 59(12), 2557-2559.
Henon, S. & Meunier, J. (Apr. 1991). “Microscope at the Brewster angle: Direct observation of first-order phase transitions in monolayers”. Review of Scientific Instruments, 62 (4), 936-939.
Hönig, D. & Möbius, D. (1991). “Direct visualization of monolayers at the air-water interface by Brewster angle microscopy”. Journal of. Physical Chemistry, 95(12), 4590-4592.
Okamoto, T. & Yamaguchi, I. (Jul. 1990). “A Surface plasmon microscope”. (Conference Proceedings Paper: Optics in Complex Systems). SPIE, 1319(12), 472-473.
Rothenhäusler, B. & Knoll, W. (Apr. 14, 1988). “Surface—plasmon microscopy”. Nature, 332, 615-617.
Yeatman, E. M. & Ash, E. A. (Jan. 1988). “Surface plasmon scanning microscopy”. (Conference Proceedings Paper: Scanning Microscopy Technologies and Applications). SPIE, 897, 100-107.
Yeatman, E. M. & Ash, E. A. (Sep. 24, 1987). “Surface plasmon microscopy”. Electronics Letters, 23(20), 1091-1092.
Bentley Dwayne L.
GE Healthcare Bio-Sciences AB
Merlino Amanda H
Toatley Jr. Gregory J
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