Optics: measuring and testing – By polarized light examination
Patent
1997-12-23
1999-08-10
Pham, Hoa Q.
Optics: measuring and testing
By polarized light examination
356369, G01N 2121
Patent
active
059367342
ABSTRACT:
The use of ellipsometry and polarimetry in analysis of partially polarized beams of electromagnetic radiation, such as result from simultaneous ellipsometric investigation of a plurality of identifiably separate laterally disposed regions on a patterned sample system, is disclosed. Practice of the present invention methodology enables evaluation of characterizing representative parameters of partially polarized beams of electromagnetic radiation, and laterally and vertically oriented physical dimensions and/or optical property(s) of at least two identifiably separate laterally disposed regions of a partially depolarizing sample system. The present invention identifies partially polarized electromagnetic beam characterizing partitioning representative parameter(s) which quantify electromagnetic beam intensity resulting from coherent and from incoherent addition of electric fields, respectively, as well as electromagnetic beam spacial and/or temporal coherence and degree of collimation characterizing representative parameters as mathematical model parameters which can be evaluated, in addition to investigated patterned sample system laterally and vertically oriented physical dimensions and/or optical property(s) characterizing representative parameters. The depolarizing effects of backside reflections associated with layers in sample system region(s) are also be included.
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Herzinger Craig M.
Johs Blaine D.
J.A. Woollam Co. Inc.
Pham Hoa Q.
Welch James D.
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