Analysing a material sample

Details Analysing a material sample Analysing a material sample

1995-06-26

1998-05-05

Teska, Kevin J.

Boots, shoes, and leggings

364485, 364498, 73800, 378 70, G06F 1520

Patent

active

057485097

ABSTRACT:
A computer system (1) has a data base (DB1) of analytical procedures (AP) for analysing a material sample (30) using radiation such as X-ray radiation. The computer system requests a user to input to the system (1) information for identifying at least one desired parameter (P.sub.d) of the material sample (30). The computer system (1) uses this information to identify the possible analytical procedures for determining that desired parameter. An analytical procedure or procedures selected by the user and/or computer system is then simulated by the computer system to produce a first simulation (I.sub.1) of radiation leaving the sample. The selected analytical procedure is simulated again after the computer system has varied the influence of the desired parameter (P.sub.d) to produce a second simulation (I.sub.2). The computer system then compares the first and second simulations (I.sub.1 and I.sub.2) to determine where the difference between the first and second simulations is greatest so as to enable an experiment to be conducted in the area or areas most sensitive to the desired parameter.

REFERENCES:
patent: 5154795 (1992-10-01), Ishida et al.
patent: 5299138 (1994-03-01), Fiori et al.
patent: 5442676 (1995-08-01), Fewster
patent: 5488476 (1996-01-01), Mansfield et al.
patent: 5546811 (1996-08-01), Rogers et al.
patent: 5583780 (1996-12-01), Kee et al.
"A High-Resolution Multiple-Crystal Multiple-Reflection Diffractometer" by Paul F. Fewster, J. Appl. Cryst. (1989) 22, pp. 64-69.

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