Chemistry: electrical and wave energy – Processes and products
Patent
1988-08-23
1990-01-02
Valentine, Donald R.
Chemistry: electrical and wave energy
Processes and products
204345, 204 561, 20412925, 2041293, 204228, 204237, 20412975, 204252, 204266, 204406, C25D 1132/21/12
Patent
active
048911038
ABSTRACT:
The disclosure relates to a process station to precisely control the electrochemical anodization of specially prepared silicon substrates. Remotely placed voltage probes are utilized to monitor changes in the potential drop across the wafer as the anodization proceeds. As the available anodilizable area changes, the voltage drop across the wafer and hence the anodization current density is maintained at the desired value by the computer through the use of active feedback provided by these probes. Any desired anodization conditions can be programmed into the system using the system software, thereby adding an even greater degree of control over the process.
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patent: 3010885 (1961-11-01), Schink
patent: 3634213 (1972-01-01), Coates
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patent: 4628591 (1986-12-01), Zorinsky et al.
Spratt David B.
Zorinsky Eldon J.
Craig George L.
Demond Thomas W.
Sharp Melvin
Texas Instruments Incorporated
Valentine Donald R.
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