Ampule tray for and method of precursor surface area

Details Ampule tray for and method of precursor surface area Ampule tray for and method of precursor surface area

2007-02-23

2010-12-07

Cleveland, Michael (Department: 1712)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C392S389000

Reexamination Certificate

active

07846256

ABSTRACT:
A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain a solid precursor, and permit the flow of a carrier gas. Furthermore, each tray comprises precursor stabilization elements designed to maintain a substantially level solid precursor powder during transport of the multi-tray precursor evaporation system.

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