Amphiphilic compounds for sequential monolayer deposition

Details Amphiphilic compounds for sequential monolayer deposition Amphiphilic compounds for sequential monolayer deposition

1991-09-03

1994-01-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

430321, 430945, 430 4, 252582, 359321, G03L 173

Patent

active

052759245

ABSTRACT:
Amphiphilic compounds and oligomers and polymers derived therefrom suitable for Langmuir Blodgett deposition wherein the compounds have a polyamide backbone and hydrophobic groups pendant therefrom which pendant groups preferably contain chromophore groups. The compounds can be used to form non-centrosymmetric bilayers and are useful for forming various non-linear optical elements.

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