Amorphous transparent conductive film, sputtering target as...

Compositions – Electrically conductive or emissive compositions – Metal compound containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C252S520100, C204S192150

Reexamination Certificate

active

07897067

ABSTRACT:
A transparent conductive film of low resistivity excelling in transparency and etching properties; a sputtering target as its raw material; an amorphous transparent electrode substrate having the transparent conductive film superimposed on a substrate; and a process for producing the same. In particular, an amorphous transparent conductive film comprising at least indium oxide and zinc oxide, which contains at least one third metal selected from among Re, Nb, W, Mo and Zr and satisfies the formulae: 0.75≦[In]/([In]+[Zn])≦0.95 (1) 1.0×10−4≦[M]/([In]+[Zn]+[M])≦1.0×10−2(2) wherein [In][Zn] and [M] represent the atomicity of In, atomicity of Zn and atomicity of third metal, respectively. This amorphous transparent conductive film exhibits amorphism ensuring excellent etching processability and exhibits low specific resistance and high mobility.

REFERENCES:
patent: 6534183 (2003-03-01), Inoue
patent: 6689477 (2004-02-01), Inoue
patent: 6998070 (2006-02-01), Inoue et al.
patent: 2001/0008710 (2001-07-01), Takatsuji et al.
patent: 1 233 082 (2002-08-01), None
patent: 1 408 137 (2004-04-01), None
patent: 5-242745 (1993-09-01), None
patent: 06088973 (1994-03-01), None
patent: 6-243740 (1994-09-01), None
patent: 6-247765 (1994-09-01), None
patent: 07-235219 (1995-09-01), None
patent: 8-218465 (1996-08-01), None
patent: 09-286070 (1997-11-01), None
patent: 2000-9923 (2000-01-01), None
patent: 2000-72189 (2000-03-01), None
patent: 2000-72526 (2000-03-01), None
patent: 2000-207935 (2000-07-01), None
patent: 2001-323370 (2001-11-01), None
patent: 2002-110365 (2002-04-01), None
patent: 03/008661 (2003-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Amorphous transparent conductive film, sputtering target as... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Amorphous transparent conductive film, sputtering target as..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amorphous transparent conductive film, sputtering target as... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2623638

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.