Amorphous silicon photosensitive member for use in electrophotog

Details Amorphous silicon photosensitive member for use in electrophotog Amorphous silicon photosensitive member for use in electrophotog

1989-04-03

1990-11-20

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430130, G03G 5028

Patent

active

049718789

ABSTRACT:
An electrophotographic photosensitive member is disclosed which comprises an electrically conductive substrate and a photoconductive layer formed on said substrate, wherein the photoconductive layer is made of amorphous silicon containing 40 atomic % or more of hydrogen and/or halogen.

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patent: 4613558 (1986-09-01), Nakagawa et al.
patent: 4683186 (1987-07-01), Ohashi et al.
M. H. Brodsky et al., Appl. Phys. Lett., (1977), 30:561-563.
H. Fritzsche, Localized States and Doping in Amorphous Semiconductor, "Proceedings of the Seventh International Conference on Amorphous and Liquid Semiconductors", (1977, W. E. Spear, Ed.).

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