Amorphous silicon multilayered photosensitive element containing

Details Amorphous silicon multilayered photosensitive element containing Amorphous silicon multilayered photosensitive element containing

1986-10-16

1988-04-26

Welsh, J. David

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430945, 430 66, G03G 514

Patent

active

047404400

ABSTRACT:
There is provided a light receiving member which comprises a support, a photosensitive layer and a surface layer, said photosensitive layer being composed of amorphous material containing silicon atoms, and at least either germanium atoms or tin atoms and said surface layer being composed of amorphous material containing silicon atoms and at least one kind selected from oxygen atoms, carbon atoms and nitrogen atoms, said support having a surface provided with irregularities composed of spherical dimples, and an optical band gap being matched at the interface between said photosensitive layer and said surface layer. The light receiving member overcomes all of the problems in the conventional light receiving member comprising a light receiving layer composed of an amorphous silicon and, in particular, effectively prevents the occurrence of interference fringe in the formed images due to the interference phenomenon thereby forming visible images of excellent quality even in the case of using coherent laser beams possible producing interference as a light source.

REFERENCES:
patent: 4618552 (1986-10-01), Tanaka

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