Amorphous silicon electrophotographic sensitive member

Details Amorphous silicon electrophotographic sensitive member Amorphous silicon electrophotographic sensitive member

1984-03-28

1987-05-19

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 57, 430 66, 430 67, G03G 5082, G03G 514

Patent

active

046668080

ABSTRACT:
The invention relates to improvements in an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon produced by glow discharge decomposition or sputtering. An electrophotographic sensitive member is formed by laminating an amorphous silicon barrier layer and an amorphous photoconductive layer successively on an electrically conductive substrate, the first mentioned layer containing an impurity of Group IIIa of Periodic Table of Elements, or nitrogen and impurity of Group IIIa of same Table, and also containing oxygen within a range of 0.1 to 20.0 atomic % at the point of the layer and in a progressively decreasing pattern throughout the rest thereof. Constructed as such, the photosensitive member has an increased photosensitivity to near-infrared beams, a large charge-holding capability, and low-rate dark attenuation characteristics. In addition, it is less expensive to manufacture.

REFERENCES:
patent: 4443529 (1984-04-01), Kanbe et al.
patent: 4486521 (1984-12-01), Misumi et al.
patent: 4489149 (1984-12-01), Kawamura et al.

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