Amorphous silicon devices and method of producing

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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357 30, 357 59, 427 39, 427 47, 427 74, 118723, 437101, H01L 3106, H01L 21205

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047059133

ABSTRACT:
An amorphous silicon material fabricated by a magnetically aligned glow discharge. A junction leg (e.g., electrostatic barrier) can be formed between two adjacent semiconductor layers by forming a first semiconductor layer by glow discharge deposition in the presence of a first magnetic field to form a first layer with a first orientation, and by forming a second semiconductor layer by glow discharge deposition in the presence of a second magnetic field to form a second layer with a second orientation different from the first orientation, with the barrier being formed between the two layers having different orientations.

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K. Mori et al, Japan J. Appl. Phys., vol. 20, pp. 2431-2432 (1981).
T. Hirao et al, J. Appl. Phys., vol. 52, pp. 7453-7455 (1981).

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