Amorphous silicon crystallization using combined beams from...

Details Amorphous silicon crystallization using combined beams from... Amorphous silicon crystallization using combined beams from...

2006-07-17

2009-11-10

Heinrich, Samuel M (Department: 3742)

Electric heating

Metal heating

By arc

C219S121760, C372S099000, C372S101000

Reexamination Certificate

active

07615722

ABSTRACT:
An amorphous silicon layer on a glass substrate is crystallized by concentrating CW radiation from a number of OPS-lasers into a line of light on the layer. The layer is moved with respect to the line of light to control the dwell time of the line on any location on the layer and to crystallize an extended area of the layer.

REFERENCES:
patent: 4911711 (1990-03-01), Telfair et al.
patent: 5676866 (1997-10-01), in den Baumen et al.
patent: 6172329 (2001-01-01), Shoemaker et al.
patent: 6285702 (2001-09-01), Caprara et al.
patent: 6478452 (2002-11-01), Richardson et al.
patent: 6537863 (2003-03-01), Jung
patent: 6563843 (2003-05-01), Tanaka
patent: 6612719 (2003-09-01), Richardson et al.
patent: 6621044 (2003-09-01), Jain et al.
patent: 6650480 (2003-11-01), Tanaka
patent: 6693257 (2004-02-01), Tanaka
patent: 6773142 (2004-08-01), Rekow
patent: 6795456 (2004-09-01), Scaggs
patent: 6898216 (2005-05-01), Kleinschmidt
patent: 6909546 (2005-06-01), Hirai
patent: 6943086 (2005-09-01), Hongo et al.
patent: 7009140 (2006-03-01), Partio et al.
patent: 7016393 (2006-03-01), Anikitchev et al.
patent: 7132204 (2006-11-01), Jung
patent: 7135390 (2006-11-01), Tanaka
patent: 7244028 (2007-07-01), Govorkov et al.
patent: 7268062 (2007-09-01), Tanaka et al.
patent: 7465648 (2008-12-01), Tanaka
patent: 2002/0196414 (2002-12-01), Manni et al.
patent: 2003/0112322 (2003-06-01), Tanaka
patent: 2004/0040938 (2004-03-01), Yamazaki et al.
patent: 2004/0120050 (2004-06-01), Tsukihara et al.
patent: 2005/0142450 (2005-06-01), Jung
patent: 2005/0157762 (2005-07-01), DeMaria et al.
patent: 2005/0270650 (2005-12-01), Tsukihara et al.
patent: 2005/0280821 (2005-12-01), Fiolka et al.
patent: 2006/0126022 (2006-06-01), Govorkov et al.
patent: 103 01 482 (2004-07-01), None
patent: 02003077809 (2003-03-01), None
In re U.S. Appl. No. 11/238,202, filed Sep. 29, 2005, by Sergei V. Govorkov et al., entitled “Speckle Reduction in Laser Illuminated Projection Displays Having a One-Dimensional Spatial Light Modulator.”
In re U.S. Appl. No. 11/350,514, filed Feb. 9, 2006, by Roman Windpassinger et al., entitled “Method and Apparatus for Coupling Laser Beams.”
In re U.S. Appl. No. 60/775,459, filed Feb. 22, 2006, by Holger Graefe et al., entitled “Method for Homogenizing a Laser Beam.”
In re U.S. Appl. No. 60/812,877, filed Jun. 12, 2006, by Joel Fontanella et al., entitled “Incoherent Combination of Laser Beams.”

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