Amorphous pure iron film

Details Amorphous pure iron film Amorphous pure iron film

1990-08-10

1992-07-07

Wyszomerski, George

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

428433, 428936, 148403, C23C 1414

Patent

active

051282143

ABSTRACT:
A metal target and a substrate are disposed in confronting relationship in a vacuum chamber whose interior is kept at high vacuum, and laser light is irradiated to the surface of the target to emit a high-speed evaporated material from the target. The high-speed evaporated material is then deposited on the substrate. By applying a predetermined voltage between the target and the substrate, the impact energy of the charged particles in the evaporated material on the substrate are controlled to form an amorphous metal film preferably a pure iron film.

REFERENCES:
patent: 4469536 (1984-09-01), Forester
patent: 4634306 (1987-01-01), Dzuir
patent: 4851296 (1989-07-01), Tenhover et al.
Applied Physics A 47, Nov. 1988, Formation of Dielectric and Semiconductor Thin Films by Laser-Assisted Evaporation, H. Sankur & J. Cheung.

Affiliated with

Also associated with

Rating

Amorphous pure iron film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Amorphous pure iron film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amorphous pure iron film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1828989