Amorphous precipitated silica having a low proportion of small p

Details Amorphous precipitated silica having a low proportion of small p Amorphous precipitated silica having a low proportion of small p

1995-05-12

1999-06-15

Brunsman, David

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423339, C01B 33143, C01B 3314

Patent

active

059119632

ABSTRACT:
Amorphous precipitated silica having a low proportion of small pores as evidenced by low Sears surface areas are useful as reinforcing pigments for various rubbers.

REFERENCES:
patent: 2657149 (1953-10-01), Iler
patent: 4590052 (1986-05-01), Chevallier et al.
patent: 4704425 (1987-11-01), Lagarde et al.
patent: 4708859 (1987-11-01), Chevallier
patent: 4874594 (1989-10-01), Chevallier
patent: 4906446 (1990-03-01), Engelbrecht et al.
patent: 5009874 (1991-04-01), Parmentier et al.
patent: 5034207 (1991-07-01), Kerner et al.
patent: 5094829 (1992-03-01), Krivak et al.
patent: 5123964 (1992-06-01), Kerner et al.
patent: 5227425 (1993-07-01), Rauline
patent: 5342598 (1994-08-01), Persello
patent: 5395605 (1995-03-01), Billion et al.

Affiliated with

Also associated with

Rating

Amorphous precipitated silica having a low proportion of small p does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Amorphous precipitated silica having a low proportion of small p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amorphous precipitated silica having a low proportion of small p will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-400786