Amorphous matrix of silicon and germanium having controlled cond

Details Amorphous matrix of silicon and germanium having controlled cond Amorphous matrix of silicon and germanium having controlled cond

1984-08-27

1986-02-11

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 67, 430 84, 430 95, G03G 506

Patent

active

045698937

ABSTRACT:
A photoconductive member comprises a substrate for photoconductive member and a light receiving layer provided on said substrate having a layer consititution in which a first layer region (G) comprising an amorphous material containing germanium atoms and a second layer region (S) exhibiting photoconductivity comprising an amorphous material containing silicon atoms are successively provided from the substrate side, said light receiving layer containing oxygen atoms together with a substance for controlling conductivity (C) in a distributed state such that, in said light receiving layer, the maximum value C(PN).sub.max of the content of said substance (C) in the layer thickness direction exists within said second layer region (S) or at the interface with said first layer region (G) and, in said second layer region(S), said substance (C) is distributed in greater amount on the side of said substrate.

REFERENCES:
patent: 4414319 (1983-11-01), Shirai et al.
patent: 4471042 (1984-09-01), Komatsu et al.
patent: 4490450 (1984-12-01), Shimizu et al.

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