Amorphous material processing method and glass substrate

Details Amorphous material processing method and glass substrate Amorphous material processing method and glass substrate

2005-07-05

2005-07-05

Alanko, Anita (Department: 1765)

Etching a substrate: processes

Forming or treating an article whose final configuration has...

C216S022000, C216S031000, C216S051000, C216S052000, C216S088000, C216S097000, C451S041000

Reexamination Certificate

active

06913702

ABSTRACT:
There are provided a method of processing an amorphous material which is capable of forming surface projections of uniform height in desired positions on the amorphous material, and a magnetic disk substrate using the amorphous material. A predetermined pressure is applied to parts of a surface of an amorphous material to form high-density compressed layers, and a surface layer of the amorphous material is removed using a treatment agent that has a different removal capacity in the compressed layers and a remaining uncompressed layer, thus making the compressed layers project out. For example, the treatment agent may be an etching solution having a different etching rate in the compressed layers and the uncompressed layer.

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