Amorphous material processing method

Details Amorphous material processing method Amorphous material processing method

2005-05-17

2010-06-01

Alanko, Anita K (Department: 1792)

Etching a substrate: processes

Forming or treating an article whose final configuration has...

C216S022000, C216S024000, C216S052000, C216S053000, C216S083000, C216S097000, C451S041000

Reexamination Certificate

active

07727407

ABSTRACT:
There are provided a method of processing an amorphous material which is capable of forming surface projections of uniform height in desired positions on the amorphous material, and a magnetic disk substrate using the amorphous material. A predetermined pressure is applied to selected parts of a surface of an amorphous material using fine particles having a hardness higher than that of the amorphous material to form high-density compressed layers, and a surface layer of the amorphous material is removed using a treatment agent that has a different removal capacity in the compressed layers and a remaining uncompressed layer, thus making the compressed layers project out. For example, the treatment agent may be an etching solution having a different etching rate in the compressed layers and the uncompressed layer.

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