Amorphous carbon film, process for producing the same and...

Details Amorphous carbon film, process for producing the same and... Amorphous carbon film, process for producing the same and...

2003-02-26

2008-08-26

Turner, Archene (Department: 1794)

Stock material or miscellaneous articles

Self-sustaining carbon mass or layer with impregnant or...

C428S212000, C428S217000, C428S336000, C428S469000

Reexamination Certificate

active

07416786

ABSTRACT:
An amorphous carbon film is provided with a density of 2.8-3.3 g/cm3. It would be preferable for the film to have: a spin density of 1×1018-1×1021spins/cm3; a carbon concentration of at least 99.5 atomic percentage; a hydrogen concentration of no more than 0.5 atomic percentage; an inert gas element concentration of no more than 0.5 atomic percentage; and a Knoop hardness of 3000-7000. A mixed layer with a thickness of at least 0.5 nm and no more than 10 nm is formed from a parent material and at least material selected from: B, Al, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, and W. An amorphous carbon film is disposed on the mixed layer or a metallic intermediate layer formed on the mixed layer, thereby increasing adhesion. This amorphous carbon film is formed with solid carbon using sputtering, cathode-arc ion plating, or laser abrasion.

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