Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1995-06-01
1997-12-02
Jones, Deborah
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423333, 423334, C01B 3332
Patent
active
056933045
ABSTRACT:
A particulate amorphous alkali metal silicate is prepared by heating a mixture of silicate glass and water or aqueous solution to a temperature of about 300.degree.-400.degree. C. to provide a foamed material that is easily formed into particles of less than 20 microns. After careful hydration, a product having 1-15% water based on loss of ignition (LOI) of product at 800.degree. C. is produced that controls the activity of magnesium in solutions and is, therefore, a useful detergent ingredient.
REFERENCES:
patent: 2179806 (1939-11-01), Wegst et al.
patent: 2206289 (1940-11-01), McDaniel
patent: 3020125 (1962-02-01), Eisenberg et al.
patent: 3450494 (1969-06-01), Gaiser
patent: 3749759 (1973-07-01), Freyhold et al.
patent: 3839226 (1974-10-01), Yates
patent: 4080187 (1978-03-01), Parnell
patent: 4585642 (1986-04-01), Rieck
patent: 5183651 (1993-02-01), Schimmel et al.
patent: 5211930 (1993-05-01), Schimmel et al.
patent: 5236682 (1993-08-01), Schimmel et al.
patent: 5268156 (1993-12-01), Schimmel et al.
Borgstedt Eric von Rehren
Denkewicz, Jr. Raymond P.
Harding Amy M.
Jones Deborah
PQ Corporation
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