Ammoniated etching solution and process for its regeneration uti

Details Ammoniated etching solution and process for its regeneration uti Ammoniated etching solution and process for its regeneration uti

1984-06-26

1986-01-14

Andrews, R. L.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204108, 204130, 252 791, C25C 112

Patent

active

045644284

ABSTRACT:
The addition of a small quantity of ammonium chloride to an ammonium sulf etching solution results in shortening the regeneration time of the spent etching solution when air or oxygen is bubbled through it to reoxidize it, and it also results in accelerating the etching rate. The extent of this improvement deteriorates with increasing chlorine ion content, disappearing when the chlorine ion content substantially exceeds 0.4% by weight of the solution and still greater chlorine ion additions are distinctly undesirable. The electrolysis of the etching solution to remove etched-away metal cathodically produces enough oxygen at the anode to prevent any substantial evolution of chlorine from the electrolytic action on the small chlorine ion content.

REFERENCES:
patent: 4269678 (1981-05-01), Faul et al.
patent: 4280887 (1981-07-01), Konstantouros
patent: 4385969 (1983-05-01), Kastening et al.

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