Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1978-06-14
1979-08-21
Hearn, Brian E.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
423 32, 423356, 423357, 75103, 75117, 204108, C25C 112
Patent
active
041652649
ABSTRACT:
An improved process for obtaining copper from a copper sulfide, in which: the copper sulfide is treated with oxygen and an aqueous leaching solution of ammonium carbonate, to form a leach liquor which contains ammonia complexes of copper sulfate and copper carbonate; the leach liquor is heated to form gaseous ammonia and carbon dioxide; the leach liquor is treated with a strongly alkaline material to precipitate sulfates and form additional gaseous ammonia; and the copper is then recovered by electrowinning. In this process, the ammonium carbonate leaching solution is formed from carbon dioxide that is generated by: adding a metal carbonate to the leach liquor during the heating thereof; and recovering the gaseous carbon dioxide, as well as the gaseous ammonia, formed during the heating of the leach liquor.
REFERENCES:
patent: 755302 (1904-03-01), Le Sueur
patent: 1131986 (1915-03-01), Benedict
patent: 1232080 (1917-07-01), Pope et al.
patent: 1509774 (1924-09-01), Perkins
patent: 1570858 (1926-01-01), Perkins
patent: 1598296 (1926-08-01), MacKay
patent: 1838587 (1931-12-01), Sperr
patent: 2727818 (1955-12-01), Kenny et al.
patent: 2727819 (1955-12-01), Kenny et al.
patent: 2822263 (1958-02-01), Forward
patent: 3347662 (1967-10-01), Snyder
patent: 3751554 (1973-08-01), Bare et al.
patent: 3775097 (1973-11-01), Cech
Hearn Brian E.
Phelps Dodge Corporation
Schapira Ronald A.
LandOfFree
Ammonia leaching does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ammonia leaching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ammonia leaching will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1322595