Chemistry: electrical and wave energy – Processes and products
Patent
1977-12-21
1979-03-13
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204 43N, C25D 352
Patent
active
041441419
ABSTRACT:
An aqueous bath for galvanic deposition of palladium or palladium alloys and a process for using involving the use of aminoacetic acid as the sole complexing agent for palladium or palladium alloys in ammonium free, alkaline aqueous media.
Heppner Klaus-Dieter
Schuster Hans-Joachim
Kaplan G. L.
Siemens Aktiengesellschaft
LandOfFree
Ammonia free palladium deposition using aminoacetic acid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ammonia free palladium deposition using aminoacetic acid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ammonia free palladium deposition using aminoacetic acid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2370600