Compositions – Fluent dielectric – N-containing
Patent
1991-08-27
1993-08-24
Pal, Asok
Compositions
Fluent dielectric
N-containing
25217421, 252528, 252550, 252DIG14, C11D 175
Patent
active
052386090
ABSTRACT:
Surfactant compositions which provide acceptable foamability at a lower cost than amine oxide/alkyl sulfate mixtures consist of (A) 5-85% by weight of an amine oxide corresponding to the formula RR'R"NO in which R is a primary alkyl group containing 6-24 carbons and R' and R" are independently selected from methyl, ethyl, and 2-hydroxyethyl, (B) 5-85% by weight of an alkyl sulfate surfactant, and (C) 10-50% by weight of a normally liquid polyalkylene glycol.
REFERENCES:
patent: 4904359 (1990-02-01), Pancheri et al.
patent: 5164120 (1992-11-01), Borland et al.
patent: 5164121 (1992-11-01), Smith et al.
patent: 5167874 (1992-12-01), Borland et al.
Borland James E.
Crutcher Terry
Sauer Joe D.
Smith Kim R.
Achutamurthy P.
Ethyl Corporation
Hogan Patricia J.
Pal Asok
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