Amine compounds and curable compositions derived therefrom

Details Amine compounds and curable compositions derived therefrom Amine compounds and curable compositions derived therefrom

2006-11-07

2006-11-07

Barts, Samuel (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C556S425000, C528S038000, C427S387000, C428S412000, C428S447000

Reexamination Certificate

active

07132557

ABSTRACT:
Disclosed are compounds produced by a process comprising the step of reacting an amine reactant with an epoxide reactant to form a hydrolytically stable carbon-nitrogen bond therebetween, wherein at least one of the amine or epoxide reactants comprises a terminal alkoxysiyl group. Also disclosed are curable compositions comprising the compounds of the present invention and the cured products derived therefrom.

REFERENCES:
patent: 3986997 (1976-10-01), Clark
patent: 4027073 (1977-05-01), Clark
patent: 4177315 (1979-12-01), Ubersax
patent: 4277287 (1981-07-01), Frye
patent: 4495360 (1985-01-01), Anthony
patent: 4746366 (1988-05-01), Philipp et al.
patent: 5206285 (1993-04-01), Castellucci
patent: 5316855 (1994-05-01), Wang et al.
patent: 5371261 (1994-12-01), Wang et al.
patent: 5792383 (1998-08-01), Reyes-Gavilan et al.
patent: 6072018 (2000-06-01), Wilkes et al.
patent: 6506921 (2003-01-01), Wilkes et al.
patent: 19840009 (2000-03-01), None
patent: 0570173 (1993-11-01), None
patent: 53135621 (1978-11-01), None
Chem Abstracts 1979:130,686, RN-69656-19-5.
Chem. Abstracts 2001:349091 (Abstract of JP2001131243 May 15, 2001) Osaki et al, rn=339322-80-4.

Affiliated with

Also associated with

Rating

Amine compounds and curable compositions derived therefrom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Amine compounds and curable compositions derived therefrom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Amine compounds and curable compositions derived therefrom will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3652365