Ambient UVL-curable elastomer mold apparatus

Plastic and nonmetallic article shaping or treating: processes – Direct application of electrical or wave energy to work – Injection molding

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Details

264496, 264266, 264259, 4251744, 425121, 425116, B29C 3508

Patent

active

058855149

ABSTRACT:
An improved process for molding parts such as gaskets using an injection molding machine including upper and lower mold plates which are transparent to UV light and have pattern recesses of differing sizes and spaced apart locations, a UV light source, and a low pressure injection system for delivering elastomers to the mold plates. The elastomers are cured by exposure to UV light. An optional carrier plate may be inserted between the mold plates and provides a rigid surface for attachment of the elastomer. The carrier plate selectively covers the pattern recesses located in the mold plates.

REFERENCES:
patent: 3867222 (1975-02-01), Plant et al.
patent: 4247510 (1981-01-01), Desverchere
patent: 4380613 (1983-04-01), Nativi
patent: 4432832 (1984-02-01), Fantone
patent: 4619804 (1986-10-01), Leonard et al.
patent: 4635947 (1987-01-01), Hatayama
patent: 4675346 (1987-06-01), Lin et al.
patent: 4681800 (1987-07-01), Zerfass et al.
patent: 4822434 (1989-04-01), Sawaki et al.
patent: 5116558 (1992-05-01), Wrobel et al.
patent: 5332536 (1994-07-01), Boeckeler
patent: 5340847 (1994-08-01), Hanazuka et al.
patent: 5510152 (1996-04-01), Boldt

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