Ambient-free processing system

Details Ambient-free processing system Ambient-free processing system

1991-08-19

1993-05-18

Hepperle, Stephen M.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34210, 432 11, 432253, F26B 100, F26B 2506

Patent

active

052109593

ABSTRACT:
An apparatus and method for processing a workpiece in an ambient-free, atmosphere of selected gas. A preparation vessel has an opening for entry of the workpiece and a diffuser oriented to emit across the vessel opening a laminar curtain flow of the selected gas which enters, purges the vessel and prevents the infiltration of air. The workpiece on its carrier is transported into the preparation vessel where air is purged out and replaced with selected gas. A processing vessel has a similar workpiece entry opening and diffuser. The preparation vessel and the processing openings are brought into coincidence, and the carrier is transported into the processing vessel for processing of the workpiece in the atmosphere of selected gas provided by the processing vessel diffuser.

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patent: 4950156 (1990-08-01), Philipossian
patent: 4955808 (1990-09-01), Miyagawa

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