Aluminum substrate for lithographic printing plate and process f

Metal treatment – Process of modifying or maintaining internal physical... – With casting or solidifying from melt

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148552, 148692, 148437, 101459, B41N 300, C22F 104

Patent

active

061561355

ABSTRACT:
An aluminum substrate for lithographic printing plates which forms uniform pits on electrolytic etching without undergoing dissolution, the substrate being obtained by electrolytic etching an aluminum plate prepared by continuous casting in a twin roll mold process, rolling, and annealing, in which the annealing is carried out in such a manner that the resulting aluminum plate may have a total electric current density of not more than 1.85.times.10.sup.-2 C/dm.sup.2 when scanned at a potential from -100 mV up to 1500 mV.

REFERENCES:
patent: 5078805 (1992-01-01), Uesugi et al.
patent: 5350010 (1994-09-01), Sawada et al.
patent: 5456772 (1995-10-01), Matsuki et al.
patent: 5462614 (1995-10-01), Sawada et al.
patent: 5507887 (1996-04-01), Uesugi et al.
patent: 5525168 (1996-06-01), Sawada et al.
patent: 5711827 (1998-01-01), Sawada et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Aluminum substrate for lithographic printing plate and process f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aluminum substrate for lithographic printing plate and process f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aluminum substrate for lithographic printing plate and process f will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-957665

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.