Aluminum oxide low pressure chemical vapor deposition (LPCVD) sy

Details Aluminum oxide low pressure chemical vapor deposition (LPCVD) sy Aluminum oxide low pressure chemical vapor deposition (LPCVD) sy

1994-04-28

1995-07-11

Breneman, R. Bruce

Coating apparatus

With indicating, testing, inspecting, or measuring means

118688, 118689, 427 8, 216 60, 216 61, B05C 1100

Patent

active

054317347

ABSTRACT:
A method and apparatus for monitoring and controlling reactant vapors prior to chemical vapor deposition (CVD). The reactant vapors are monitored at full concentration without sampling as they are transported to a CVD reactor. Contaminants detected cause a process controller to switch the transport path to direct reactant vapors to a system pump.

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