Aluminum oxide and aluminum oxynitride layers for use with...

Details Aluminum oxide and aluminum oxynitride layers for use with... Aluminum oxide and aluminum oxynitride layers for use with...

2005-07-19

2010-10-12

Won, Bumsuk (Department: 2889)

Electric lamp and discharge devices

With luminescent solid or liquid material

Solid-state type

C313S502000, C313S503000, C313S509000

Reexamination Certificate

active

07812522

ABSTRACT:
A novel laminate is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and an aluminum oxide or aluminum oxynitride layer provided directly adjacent and in contact with the bottom of the phosphor thin film layer. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.

REFERENCES:
patent: 4209705 (1980-06-01), Washida et al.
patent: 4751427 (1988-06-01), Barrow et al.
patent: 4975338 (1990-12-01), Kageyama et al.
patent: 5229628 (1993-07-01), Kobayashi et al.
patent: 5244750 (1993-09-01), Reilly et al.
patent: 5432015 (1995-07-01), Wu et al.
patent: 5496597 (1996-03-01), Soininen et al.
patent: 5598059 (1997-01-01), Sun et al.
patent: 5858561 (1999-01-01), Epstein et al.
patent: 6113977 (2000-09-01), Soininen et al.
patent: 6146225 (2000-11-01), Sheats et al.
patent: 6358632 (2002-03-01), Dickey et al.
patent: 6383048 (2002-05-01), Yang et al.
patent: 6416888 (2002-07-01), Kawamura et al.
patent: 6447654 (2002-09-01), Kosyachkov
patent: 6576482 (2003-06-01), Aggarwal et al.
patent: 6589674 (2003-07-01), Li et al.
patent: 6650047 (2003-11-01), Aoki et al.
patent: 6699596 (2004-03-01), Yano et al.
patent: 6734622 (2004-05-01), Kanitz et al.
patent: 6743475 (2004-06-01), Skarp et al.
patent: 2002/0031688 (2002-03-01), Tanabe et al.
patent: 2002/0079836 (2002-06-01), Tanabe et al.
patent: 2002/0094451 (2002-07-01), Li et al.
patent: 2002/0106451 (2002-08-01), Skarp et al.
patent: 2002/0125821 (2002-09-01), Steckl et al.
patent: 2002/0155320 (2002-10-01), Park et al.
patent: 2002/0177008 (2002-11-01), Shirakawa et al.
patent: 2003/0118864 (2003-06-01), Kosyachkov
patent: 2003/0146691 (2003-08-01), Yano et al.
patent: 2003/0160247 (2003-08-01), Miyazawa
patent: 2004/0046498 (2004-03-01), Aoki et al.
patent: 2004/0080263 (2004-04-01), Yamazaki et al.
patent: 2004/0113547 (2004-06-01), Son et al.
patent: 2004/0115859 (2004-06-01), Murayama et al.
patent: 2004/0135495 (2004-07-01), Wu et al.
patent: 2004/0170864 (2004-09-01), Liu
patent: 2004/0206935 (2004-10-01), Miura et al.
patent: 2006/0250082 (2006-11-01), Yoshida et al.
patent: 2434335 (2002-07-01), None
patent: 2434335 (2002-07-01), None
patent: 2469508 (2003-07-01), None
patent: 2469508 (2003-07-01), None
patent: 2478439 (2003-10-01), None
patent: 2478439 (2003-10-01), None
patent: 2482833 (2003-10-01), None
patent: 2482833 (2003-10-01), None
patent: 2495771 (2004-03-01), None
patent: 2495771 (2004-03-01), None
patent: 02-103893 (1990-04-01), None
patent: 08-288069 (1996-11-01), None
patent: 10-092580 (1998-04-01), None
patent: 2003-332081 (2003-11-01), None
patent: WO03/055636 (2003-07-01), None
patent: WO2004/036961 (2004-04-01), None
patent: WO 2004/057925 (2004-07-01), None
PCT International Search Report; PCT/CA2005/001151; mailed Nov. 10, 2005.
PCT International Search Report, Nov. 10, 2005.
Supplementary European Search Report dated Jul. 16, 2008.

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