Aluminum incorporation in porous dielectric for improved...

Details Aluminum incorporation in porous dielectric for improved... Aluminum incorporation in porous dielectric for improved...

2006-06-30

2008-09-09

Goudreau, George A. (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C438S704000, C438S705000, C438S714000, C438S722000, C438S723000, C438S724000

Reexamination Certificate

active

07422020

ABSTRACT:
A porous dielectric layer is formed on a substrate. Aluminum is incorporated in the porous dielectric layer with a pattern process using an Aluminum gas precursor. The incorporated Aluminum improves the mechanical properties of the porous dielectric layer.

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