Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1993-11-30
1996-05-07
Breneman, R. Bruce
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
216100, 252 795, H01L 2100
Patent
active
055137660
ABSTRACT:
Improvements in the etching of aluminum and aluminum alloys is obtained by etching the workpiece in a caustic etching bath in the presence of an anionic surfactant of the sulfate or sulfonate type. Satisfactory results are achieved with reduced amounts of dissolved aluminum.
REFERENCES:
patent: 2618604 (1952-11-01), Schaeffer
patent: 2853372 (1958-09-01), McDonald
patent: 3083165 (1963-03-01), Carroll
patent: 3255118 (1966-06-01), Carroll
patent: 4349411 (1982-09-01), Okinaka
patent: 4853093 (1989-08-01), Brenk et al.
"A Long Lasting Aluminum Etching Bath", H. V. Smith, J. W. Carroll, Plating, vol. 59, No. 12, Dec., 1972, pp. 1158-1162.
PCT Search Report for PCT/EP 94/03961 dated 16, Jan. 1995.
Derwent Abstracts of: SU 1057575; SU 1188222; SU 1678901.
Patel Pinakin
Ranieri Richard L.
Battle Carl W.
Breneman R. Bruce
Goudreau George
Honor Robert S.
Pfeiffer Hesna J.
LandOfFree
Aluminum etching does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Aluminum etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aluminum etching will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1221552