Aluminum complex derivatives for chemical vacuum evaporation and

Details Aluminum complex derivatives for chemical vacuum evaporation and Aluminum complex derivatives for chemical vacuum evaporation and

1999-03-22

2000-11-07

McKane, Joseph

Coating processes

Electrical product produced

Metallic compound coating

544225, 546 11, 548402, 549 3, 549206, 427250, C07D20700, C07D33346, C07F 506, B05D 512

Patent

active

061433578

ABSTRACT:
Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organimetallic compounds and methods of forming aluminum films.

REFERENCES:
patent: 4923717 (1990-05-01), Gladfelter
patent: 5178911 (1993-01-01), Gordon et al.
patent: 5180687 (1993-01-01), Mikoshiba et al.
patent: 5191099 (1993-03-01), Gladfelter et al.
patent: 5330633 (1994-07-01), Matsumoto et al.
patent: 5393699 (1995-02-01), Mikoshiba et al.
Atwood et al., Inorg. Chem. vol. 32, No. 16, pp. 3482-3487, 1993.
"Reactions of Lithium Aluminum Hydride with Representative Elements of the Main Groups of the Periodic System" by Thomas Wartik and H. J. Schlesinger; J. Am. Chem. Soc. vol. 75 pp. 835-839, 1953.

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